The patterning of sub-500 nm inorganic oxide structures
The patterning of sub-500 nm inorganic oxide structures
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DOI：
10.1002/adma.200702495
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发表时间：
2008-07-17
影响因子：
29.4
通讯作者：
DeSimone, Joseph M.
中科院分区：
文献类型：
--
作者：
Hampton, Meredith J.;Williams, Stuart S.;DeSimone, Joseph M.
弹性体全氟聚醚模具应用于亚500纳米无机氧化物特征的图案阵列。这种通用的软光刻技术可用于图案化各种材料;在这项工作中，包括Ti 〇 2、Sn 〇 2、ZnO、ITO和BaTi 〇 3的无机氧化物在具有不同纵横比的各种衬底上图案化。图中示出了TiO 2柱的示例。
Elastomeric perfluoropolyether molds are applied to pattern arrays of sub-500 nm inorganic oxide features. This versatile soft-lithography technique can be used to pattern a wide range of materials; in this work inorganic oxides including Ti02, Sn02, ZnO, ITO, and BaTi03 are patterned on a variety of substrates with different aspect ratios. An example of Ti02 posts is shown in the figure.