Deposition and characterization of diamond coatings on WC-Co cutting tools with W/Al interlayer

Deposition and characterization of diamond coatings on WC-Co cutting tools with W/Al interlayer
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DOI:
10.1016/j.diamond.2009.12.019
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发表时间:
2010-05-01
影响因子:
4.1
通讯作者:
Hirose, A.
Hirose, A.
中科院分区:
材料科学2区
文献类型:
--
作者:
Tang, Y.;Li, Y. S.;Hirose, A.

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为了提高金刚石的形核能力和附着力,在硬质合金刀具上采用W/Al双中间层化学气相沉积金刚石涂层。在WC-Co上直接沉积一层薄的Al层来抑制Co引起的界面石墨化,而附加一层薄的W层来增强金刚石成核。研究了在W/Al/WC-Co基体上生长的金刚石涂层的组织结构和结合力,并与在W/WC-Co基体上和裸WC-Co基体上生长的金刚石涂层进行了比较。结果表明,在W/Al基体上生长的金刚石涂层是连续的,具有良好的结合力。该中间层的优点包括即使在典型的微晶金刚石生长条件下也可以获得纳米晶体金刚石。此外,总厚度为50-65 nm的W/Al中间层将导致涂层切削工具的切削刃锋利度和机械完整性的边际损失。(C)2010爱思唯尔有限公司版权所有。
A new double interlayer W/Al was developed for chemical vapor deposition (CVD) of diamond coatings on cemented WC-Co cutting tools to enhance diamond nucleation and adhesion. A thin layer of Al directly deposited on WC-Co is used to suppress the interfacial graphitization induced by Co and an additional thin layer of W is used to enhance diamond nucleation. The microstructure and adhesion of diamond coatings grown on the W/Al/WC-Co and, for comparison, on W/WC-Co as well as bare WC-Co were investigated. The results demonstrate that diamond coatings grown on W/Al are continuous and well adhesive. The advantage of the interlayer includes that nano-crystalline diamond can be achieved even under typical microcrystalline diamond growth conditions. In addition, the W/Al interlayer of overall 50-65 nm thickness would cause marginal lost of cutting edge sharpness and mechanical integrity of coated cutting tools. (C) 2010 Elsevier B.V. All rights reserved.