Mechanism of Fermi-level stabilization in semiconductors.

Mechanism of Fermi-level stabilization in semiconductors.
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半导体费米能级稳定机制。

DOI:
10.1103/physrevb.37.4760
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发表时间:
1988
期刊:
Physical review. B, Condensed matter
影响因子:
--
通讯作者:
Walukiewicz
Walukiewicz
中科院分区:
--
文献类型:
--
作者:
Walukiewicz

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本文提出了严重辐照损伤半导体中费米能级与金属-半导体界面处费米能级之间的显著相关性。相关性提供了支持肖特基势垒形成的缺陷模型的关键证据。两种情况下的费米能级能量对应于sp/sup 3/杂化的平均能量。以GaAs为例,详细描述了由两性悬键缺陷引起的费米能级稳定
A striking correlation between the Fermi-level in heavily radiation damaged semiconductors and at metal-semiconductor interfaces is presented. The correlation provides critical evidence supporting the defect model for Schottky-barrier formation. The Fermi-level energy for both situations corresponds to the average energy of the sp/sup 3/ hybrid. In the case of GaAs, a detailed description of the Fermi-level stabilization caused by amphoteric dangling-bond-like defects is given