Processing Induced Defects in Silica Glasses
Processing Induced Defects in Silica Glasses
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DOI：
10.7567/jjaps.37s1.5
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发表时间：
1998
影响因子：
1.5
通讯作者：
Jong-Won Lee;George H. Sigel, Jr.
中科院分区：
文献类型：
--
作者：
Jong-Won Lee;George H. Sigel, Jr.
研究了拉丝工艺对石英光纤缺陷的影响。本研究着重于低羟基氧缺陷二氧化硅中由拉丝过程引起的氧缺陷中心（ODC）和E'中心。利用248 nm处的光吸收带研究了光纤化过程中产生的ODC。在E'中心的情况下，已经使用光学吸收和电子自旋共振（ESR）。还调查了颈缩区域中的ODC群体。在颈缩区域内观察到ODC的浓度急剧增加。
The effects of the fiber drawing process on defects of silica fibers have been investigated. This study has focused on the oxygen deficient centers (ODCs) and E' centers induced by the fiber drawing process in low-OH oxygen deficient silica. The ODCs induced by the fiberization process have been investigated using the optical absorption band at 248 nm. In case of E' centers, optical absorption and electron spin resonance (ESR) have been used. The population of ODCs in the neck-down region has also been investigated. The concentration of ODCs are observed to increase dramatically within the neck-down region.