Tailoring material properties of electrochemically deposited Al film from chloroaluminate ionic liquid for microsystem technology using pulsed deposition
Tailoring material properties of electrochemically deposited Al film from chloroaluminate ionic liquid for microsystem technology using pulsed deposition
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DOI：
10.1016/j.sna.2020.112384
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发表时间：
2020-12-01
影响因子：
4.6
通讯作者：
Tanaka, Shuji
中科院分区：
文献类型：
--
作者：
Al Farisi, Muhammad Salman;Tsukamoto, Takashiro;Tanaka, Shuji
为了在微系统中实际使用电化学沉积的铝膜，必须阐明其材料性质，以及不同沉积条件的影响。本文对氯铝酸盐离子液体电解液电化学沉积铝膜的微观结构、电性能、力学性能和热学性能进行了全面的研究。根据沉积条件的不同，薄膜的纳米压痕硬度和弹性模数分别在486~908 Mpa和41~102 Gpa之间变化。电阻率和热膨胀系数分别在51-160nS2m和2-20ppm/K之间变化。并与用其他方法制备的Al薄膜的结果进行了比较。研究发现，这些特性与沉积的微观结构有关，这种微结构可以根据沉积条件进行调整。用扫描电子显微镜(SEM)和背散射电子能谱(EBSD)对镀层的微观结构进行了综合表征。这些结果对今后薄膜的应用具有一定的指导意义。(C)2020爱思唯尔B.V.保留所有权利。
To practically utilize an electrochemically deposited Al film in microsystems, its material properties have to be elucidated, along with the influence of different deposition conditions. In this study, microstructure, electrical, mechanical and thermal properties of electrochemically deposited Al film from a chloroaluminate ionic liquid electrolyte are comprehensively investigated. The nanoindentation hardness and elastic modulus of the film varied between 486-908 MPa and 41-102 GPa, respectively, depending on the deposition condition. The electrical resistivity and the coefficient of thermal expansion varied between 51-160 nS2 m and 2-20 ppm/K, respectively. The results are compared to those of Al thin films deposited using other techniques. The characterized properties were found to be associated to the microstuctures of the deposits, which can be tailored by the deposition conditions. The microstructures of the deposits were comprehensively characterized by cross-sectional scanning electron microscope (SEM) and electron backscatter diffraction (EBSD) spectroscopy. These results are useful as a design guide for the future applications of the film. (c) 2020 Elsevier B.V. All rights reserved.