Experimental realization of an extended Fermi-Hubbard model using a 2D lattice of dopant-based quantum dots.
Experimental realization of an extended Fermi-Hubbard model using a 2D lattice of dopant-based quantum dots.
复制标题
DOI:
10.1038/s41467-022-34220-w
复制
发表时间:
2022-11-11
影响因子:
16.6
通讯作者:
中科院分区:
文献类型:
--
作者:
The Hubbard model is an essential tool for understanding many-body physics in condensed matter systems. Artificial lattices of dopants in silicon are a promising method for the analog quantum simulation of extended Fermi-Hubbard Hamiltonians in the strong interaction regime. However, complex atom-based device fabrication requirements have meant emulating a tunable two-dimensional Fermi-Hubbard Hamiltonian in silicon has not been achieved. Here, we fabricate 3 × 3 arrays of single/few-dopant quantum dots with finite disorder and demonstrate tuning of the electron ensemble using gates and probe the many-body states using quantum transport measurements. By controlling the lattice constants, we tune the hopping amplitude and long-range interactions and observe the finite-size analogue of a transition from metallic to Mott insulating behavior. We simulate thermally activated hopping and Hubbard band formation using increased temperatures. As atomically precise fabrication continues to improve, these results enable a new class of engineered artificial lattices to simulate interactive fermionic models. Atomically precise artificial lattices of dopant-based quantum dots offer a tunable platform for simulations of interacting fermionic models. By leveraging advances in fabrication and atomic-state control, Wang et al. report quantum simulations of the 2D Fermi-Hubbard model on a 3 × 3 few-dopant quantum dot array.
登录
查看更多内容
影响因子:
13.6
作者:
Gramse G;Kölker A;Lim T;Stock TJZ;Solanki H;Schofield SR;Brinciotti E;Aeppli G;Kienberger F;Curson NJ
通讯作者:
Curson NJ
影响因子:
3.7
作者:
Le, Nguyen H.;Fisher, Andrew J.;Ginossar, Eran
通讯作者:
Ginossar, Eran
影响因子:
64.8
作者:
Azurenko, Anton M.;Chiu, Christie S.;Greiner, Markus
通讯作者:
Greiner, Markus
影响因子:
3.1
作者:
Kotlyar, R;DasSarma, S
通讯作者:
DasSarma, S
影响因子:
3.7
作者:
Carter, Damien J.;Warschkow, Oliver;McKenzie, David R.
通讯作者:
McKenzie, David R.