Elastic constant and Brillouin oscillations in sputtered vitreous SiO2 thin films

Elastic constant and Brillouin oscillations in sputtered vitreous SiO2 thin films
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DOI:
10.1103/physrevb.78.134204
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发表时间:
2008-10-01
期刊:
影响因子:
3.7
通讯作者:
Kihara, N.
Kihara, N.
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
Ogi, H.;Shagawa, T.;Kihara, N.

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We studied the relationship between elastic constants and microstructure in sputtered vitreous SiO2 thin films using pump-probe picosecond laser ultrasound. The delayed probe light pulse is diffracted by the acoustic wave excited by the pump light pulse, inducing Brillouin oscillations, seen as reflectivity change in the probe pulse, whose frequency can be used to extract the sound velocity and elastic moduli. Theoretical calculations were made to explain the asymmetric response of Brillouin oscillations and to predict the possible error limit of the determined elastic constants. The thin films containing defects exhibited lower elastic constant. A micromechanics modeling was developed to evaluate defect porosity and attenuation caused by scattering was able to predict the defect size. Elastic moduli of the defect-free specimens increased with increasing sputtering power, eventually exceeding the bulk value, and correlated with phonon frequencies, indicating that the decrease in the Si-O-Si bond angle of the tetrahedral structure increased the stiffness.