Immersion zone-plate-array lithography
Immersion zone-plate-array lithography
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DOI：
10.1116/1.2127942
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发表时间：
2005-11-01
影响因子：
1.4
通讯作者：
Menon, R
中科院分区：
文献类型：
--
作者：
Chao, D;Patel, A;Menon, R
在波带片阵列光刻技术中，采用浸没方案来提高分辨率、曝光宽容度和焦深。我们相信这是第一次在无掩模光刻系统中实现浸没方案。用去离子水代替空气作为波带片阵列和衬底之间的介质，有效地增加了系统的数值孔径，从而增强了其图案化能力。介绍了浸没式波带片的设计和制作过程。其行为的特点是通过实验重建其点扩散函数，并与理论模型进行比较。印刷了各种各样的图案，证明了浸没ZPAL的改进的光刻性能。(c)2005年美国真空学会。
An immersion scheme is used to improve resolution, exposure latitude, and depth-of-focus in zone-plate-array lithography (ZPAL). We believe this is the first implementation of an immersion scheme in a maskless lithography system. Replacing air with de-ionized water as the medium between the zone-plate array and the substrate effectively increases the system's numerical aperture and consequently, enhances its patterning capabilities. The design and fabrication process of an immersion zone plate is described. Its behavior is then characterized through the experimental reconstruction of its point-spread function, and compared to the theoretical model. A wide variety of patterns were printed, demonstrating the improved lithographic performance of immersion ZPAL. (c) 2005 American Vacuum Society.