Hydrogen Bonding in M (OD) 2 Compounds Under Pressure

Hydrogen Bonding in M (OD) 2 Compounds Under Pressure
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M (OD) 2 化合物在压力下的氢键作用

DOI:
10.4131/jshpreview.7.211
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发表时间:
1998
期刊:
The Review of High Pressure Science and Technology
影响因子:
--
通讯作者:
S. Klotz
S. Klotz
中科院分区:
--
文献类型:
--
作者:
J. Parise;Hugh Cox;H. Kagi;Rui Li;W. G. Marshall;J. Loveday;S. Klotz

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氘化氢氧化物(M (OD) 2)的结构M=Mg, Ca, Mn, Ni, Co)用Rietveld方法和在高压下收集的中子粉末衍射数据进行了精炼。在压力增大的情况下,O-D原子间距离无统计学意义的增加,而氢键相互作用d。O随着距离的减小而增大,O- d…O角增加。分子内的O-D键价,间接由分子间的d。随着压力的增加,所有材料的距离都稳定地减小。
The structures of the deuterated hydroxides (M (OD) 2; M=Mg, Ca, Mn, Ni, Co) have been refined using the Rietveld method and neutron powder diffraction data collected at high pressure. There is no statistically significant increase in the O-D interatomic distance at increased pressure while the hydrogen bonding interaction D. . . O increases as this distance decreases and the O-D. . . O angle increases. The intramolecular O-D bond valences, determined indirectly from the intermolecular D. . . O distances, decrease steadily for all materials as pressure is increased.
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