Demonstration of Nanomachining With Focused Extreme Ultraviolet Laser Beams
Demonstration of Nanomachining With Focused Extreme Ultraviolet Laser Beams
复制标题
使用聚焦极紫外激光束进行纳米加工的演示
DOI：
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发表时间：
2012
影响因子：
4.9
通讯作者：
Jorge J. Rocca
中科院分区：
文献类型：
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作者：
H. Bravo;B. Szapiro;Przemyslaw Wachulak;M. Marconi;W. Chao;E. Anderson;C. Menoni;Jorge J. Rocca
激光加工微结构的一个主要挑战是将空间域扩展到纳米技术感兴趣的较小尺寸。我们展示了使用聚焦极紫外（EUV）激光束直接加工纳米级结构的可行性。通过使用菲涅尔波带板透镜聚焦来自类氖 Ar 毛细管放电台式激光器的 46.9 nm 波长光束，在聚甲基丙烯酸甲酯光刻胶上烧蚀干净的亚 200 nm 宽沟槽（半峰全宽 130 nm）。考虑到干净的 82 nm 孔也使用相同的激光进行烧蚀，可以预期聚焦 EUV 激光将能够加工明显更小的特征。
A major challenge in laser machining of microstructures is that of extending the spatial domain to the smaller dimensions of interest in nanotechnology. We demonstrate the feasibility of directly machining nanoscale structures with a focused extreme ultraviolet (EUV) laser beam. Clean sub-200-nm-wide trenches (130-nm full width at half maximum) were ablated on polymethyl methacrylate photoresist by focusing the 46.9-nm wavelength beam from a Ne-like Ar capillary discharge tabletop laser with a Fresnel zone plate lens. Considering that clean 82-nm holes were also ablated using the same laser, it can be expected that focused EUV laser light will enable the machining of significantly smaller features.