Ultra-confined Propagating Exciton-Plasmon Polaritons Enabled by Cavity-Free Strong Coupling: Beating Plasmonic Trade-Offs.
Ultra-confined Propagating Exciton-Plasmon Polaritons Enabled by Cavity-Free Strong Coupling: Beating Plasmonic Trade-Offs.
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DOI:
10.1186/s11671-022-03748-7
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发表时间:
2022-11-18
影响因子:
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Hybrid coupling systems consisting of transition metal dichalcogenides (TMD) and plasmonic nanostructures have emerged as a promising platform to explore exciton–plasmon polaritons. However, the requisite cavity/resonator for strong coupling introduces extra complexities and challenges for waveguiding applications. Alternatively, plasmonic nano-waveguides can also be utilized to provide a non-resonant approach for strong coupling, while their utility is limited by the plasmonic confinement-loss and confinement-momentum trade-offs. Here, based on a cavity-free approach, we overcome these constraints by theoretically strong coupling of a monolayer TMD to a single metal nanowire, generating ultra-confined propagating exciton–plasmon polaritons (PEPPs) that beat the plasmonic trade-offs. By leveraging strong-coupling-induced reformations in energy distribution and combining favorable properties of surface plasmon polaritons (SPPs) and excitons, the generated PEPPs feature ultra-deep subwavelength confinement (down to 1-nm level with mode areas ~ 10–4 of λ2), long propagation length (up to ~ 60 µm), tunable dispersion with versatile mode characters (SPP- and exciton-like mode characters), and small momentum mismatch to free-space photons. With the capability to overcome the trade-offs of SPPs and the compatibility for waveguiding applications, our theoretical results suggest an attractive guided-wave platform to manipulate exciton–plasmon interactions at the ultra-deep subwavelength scale, opening new horizons for waveguiding nano-polaritonic components and devices. The online version contains supplementary material available at 10.1186/s11671-022-03748-7.
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DOI:
10.1021/la102070c
发表时间:
2010-09-21
期刊:
Langmuir : the ACS journal of surfaces and colloids
影响因子:
--
作者:
Dean SL;Stapleton JJ;Keating CD
通讯作者:
Keating CD
影响因子:
7
作者:
Geisler, Mathias;Cui, Ximin;Stenger, Nicolas
通讯作者:
Stenger, Nicolas
影响因子:
3.7
作者:
Chang, D. E.;Sorensen, A. S.;Lukin, M. D.
通讯作者:
Lukin, M. D.
影响因子:
3.8
作者:
Li, Qiang;Qiu, Min
通讯作者:
Qiu, Min
影响因子:
35
作者:
Bylinkin, Andrei;Schnell, Martin;Hillenbrand, Rainer
通讯作者:
Hillenbrand, Rainer