High-yield exfoliation of MoS2 (WS2) monolayers towards efficient photocatalytic hydrogen evolution
High-yield exfoliation of MoS2 (WS2) monolayers towards efficient photocatalytic hydrogen evolution
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MoS2(WS2)单层的高产率剥离可实现高效光催化析氢
DOI:
10.1016/j.cej.2021.133286
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发表时间:
2021-11
影响因子:
15.1
通讯作者:
Xiaobin Fan
中科院分区:
文献类型:
--
作者:
Jiapeng Liu;Huibin Liu;Xiaobin Fan;Yang Li;Fengbao Zhang;Xiaobin Fan
• The fraction of edges of MoS 2 (WS 2 ) can be increased by partial etching strategy. • High-yield MoS 2 (WS 2 ) monolayers were obtained by liquid phase exfoliation. • The semiconducting 2H phase was retained in the MoS 2 (WS 2 ) monolayers. • Exfoliated MoS 2 (WS 2 ) monolayers exhibited superior cocatalytic performance. Monolayer MoS 2 (WS 2 ) nanosheets have triggered tremendous interest due to their fascinating unique properties, but high-yield production of single-layer MoS 2 (WS 2 ) still remains an enormous challenge and of great interest. Herein, we report a facile efficient partial etching strategy to tailor thickness and lateral size of MoS 2 (WS 2 ) so as to increase the fraction of edges, which remarkably enhanced the yield of monolayer MoS 2 (20%) and WS 2 (12%) nanosheets by liquid phase exfoliation. As a proof of concept, the exfoliated monolayer MoS 2 (WS 2 ) nanosheets were applied as the cocatalysts for photocatalytic hydrogen evolution. Notably, the optimized hybrids exhibit excellent hydrogen evolution performance, which are over 31-fold (MoS 2 /CdS) and 47-fold (WS 2 /CdS) higher that of bare CdS counterpart, respectively. Hence, this work not only may pave the new way for the high-yield production of transition-metal dichalcogenides monolayers by liquid phase exfoliation, but also provide the possibility for the further efficiently exfoliating other two-dimension layered materials.
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影响因子:
--
作者:
Kai-Ge Zhou;Nan-nan Mao;Hang-Xing Wang;Yong Peng;Hao‐Li Zhang
通讯作者:
Kai-Ge Zhou;Nan-nan Mao;Hang-Xing Wang;Yong Peng;Hao‐Li Zhang
影响因子:
17.1
作者:
Li, Qian;Chen, Chuanshuang;Mai, Yiyong
通讯作者:
Mai, Yiyong
影响因子:
17.1
作者:
Che, Ali Jawaid Justin;Drummy, Lawrence F.;Vaia, Richard A.
通讯作者:
Vaia, Richard A.
影响因子:
15
作者:
Li, Guoqing;Zhang, Du;Cao, Linyou
通讯作者:
Cao, Linyou
影响因子:
8.6
作者:
Jawaid, Ali;Nepal, Dhriti;Vaia, Richard A.
通讯作者:
Vaia, Richard A.