Multiple Linear Regression Modeling of Nanosphere Self-Assembly via Spin Coating
Multiple Linear Regression Modeling of Nanosphere Self-Assembly via Spin Coating
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DOI：
10.1021/acs.langmuir.1c02057
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发表时间：
2021-10-13
期刊：
影响因子：
3.9
通讯作者：
Warren, Roseanne
中科院分区：
文献类型：
--
作者：
Razaulla, Talha;Bekeris, Michael;Warren, Roseanne
纳米球光刻采用单层或多层自组装纳米球作为自底向上纳米级图案化的模板。在大面积上产生具有最小填充缺陷的自组装纳米球的能力对于推进纳米球光刻的应用至关重要。旋涂是一种简单易行、高通量的纳米球自组装方法。然而，纳米球旋涂可能的工艺参数范围很广，以及纳米球自组装对这些参数的敏感性，可以通过这种方法导致纳米球配置的高度可变的结果。寻找纳米球旋涂的最佳工艺参数仍然具有挑战性。这项工作采用了实验设计的方法来调查的影响，七个因素纳米球的重量%，甲醇/水的比例，溶液体积，润湿时间，旋转时间，每分钟的最大转数，和斜坡率上的两个响应变量的百分比六方密堆积和宏观尺度覆盖的纳米球。单响应和多响应线性回归模型识别对两个响应变量的结果具有统计学显著性的主交互效应和双向交互效应，并能够预测优化设置。结果表明，大的宏观尺度覆盖所需的高斜坡率和需要最大限度地减少高剪切力和蒸发速率，以确保纳米球适当地自组装成六边形包装阵列之间的权衡。
Nanosphere lithography employs single- or multilayer self-assembled nanospheres as a template for bottom-up nanoscale patterning. The ability to produce self-assembled nanospheres with minimal packing defects over large areas is critical to advancing applications of nanosphere lithography. Spin coating is a simple-to-execute, high-throughput method of nanosphere self-assembly. The wide range of possible process parameters for nanosphere spin coating, however-and the sensitivity of nano-sphere self-assembly to these parameters-can lead to highly variable outcomes in nanosphere configuration by this method. Finding the optimum process parameters for nanosphere spin coating remains challenging. This work adopts a design-of-experiments approach to investigate the effects of seven factors-nanosphere wt%, methanol/water ratio, solution volume, wetting time, spin time, maximum revolutions per minute, and ramp rate-on two response variables-percentage hexagonal close packing and macroscale coverage of nanospheres. Single-response and multiple-response linear regression models identify main and two-way interaction effects of statistical significance to the outcomes of both response variables and enable prediction of optimized settings. The results indicate a tradeoff between the high ramp rates required for large macroscale coverage and the need to minimize high shear forces and evaporation rates to ensure that nanospheres properly self-assemble into hexagonally packed arrays.