Effects of Ar ion bombardment by unbalanced magnetron sputtering on mechanical and thermal properties of Ti-Cu-Zr-Ni-Hf-Si thin film metallic glass
Effects of Ar ion bombardment by unbalanced magnetron sputtering on mechanical and thermal properties of Ti-Cu-Zr-Ni-Hf-Si thin film metallic glass
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DOI：
10.1016/j.matdes.2016.09.005
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发表时间：
2016-12
影响因子：
8.4
通讯作者：
J. Kobata;Ken-ichi Miura
中科院分区：
文献类型：
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作者：
J. Kobata;Ken-ichi Miura
本研究研究了不平衡磁控溅射 (UBMS) 沉积过程中 Ar 离子轰击对 Ti-Cu-Zr-Ni-Hf-Si 薄膜金属玻璃的结构、机械和热性能的影响。结果发现，由于 Ar 离子轰击，Ar 被纳入沉积薄膜的非晶结构中，并且通过控制 Ar 离子轰击的强度，薄膜中的 Ar 含量可以从 0.2 at% 变为 14.7 at%。轰击工艺提高了薄膜的热稳定性。此外，随着轰击强度的增加，薄膜的表面和横截面形貌变得非常光滑且高度致密。另一方面，非晶结构的密度随着Ar含量的增加而降低。硬度和杨氏模量也随着Ar离子轰击强度的变化而变化。薄膜硬度的变化是由于薄膜中残余应力的变化造成的。因此，UBMS沉积过程中的Ar离子轰击是改善薄膜金属玻璃的结构以及机械和热性能的有用方法。
This study investigated the effects of Ar ion bombardment during deposition by unbalanced magnetron sputtering (UBMS) on the structure and mechanical and thermal properties of Ti–Cu–Zr–Ni–Hf–Si thin film metallic glass. It was found that Ar was incorporated into the amorphous structure of the deposited films because of the Ar ion bombardment and that the Ar content in the films could be changed from 0.2 at% to 14.7 at% by controlling the intensity of Ar ion bombardment. The thermal stability of the films was improved by the bombardment process. Further, the surface and cross-sectional morphologies of the films became very smooth and highly dense with an increase in the bombardment intensity. On the other hand, the density of the amorphous structure decreased with the increase in the Ar content. The hardness and Young's modulus also changed with the intensity of Ar ion bombardment. The change in the film hardness was due to the change in the residual stress in the films. Thus, Ar ion bombardment during deposition by UBMS is a useful method for improving the structure and mechanical and thermal properties of thin film metallic glasses.