Nanoporous Atomically Thin Graphene Filters for Nanoscale Aerosols
Nanoporous Atomically Thin Graphene Filters for Nanoscale Aerosols
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DOI：
10.1021/acsami.2c10827
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发表时间：
2022-08-29
影响因子：
9.5
通讯作者：
Kidambi, Piran R.
中科院分区：
文献类型：
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作者：
Cheng, Peifu;Espano, Jeremy;Kidambi, Piran R.
从气流中过滤纳米颗粒气溶胶对于各种个人防护设备（PPE）非常重要，包括用于医学研究、医疗保健、执法、急救人员和军事应用的面罩。能够过滤< 300 nm的纳米颗粒的常规PPE通常体积庞大并且牺牲透气性以最大化保护免于暴露于来自空气流的有害纳米颗粒气溶胶，包括约20 - 300 nm的病毒。在这里，我们表明，通过简易氧等离子体蚀刻引入到支撑在聚碳酸酯径迹蚀刻支撑物上的厘米级单层石墨烯中的纳米孔可以允许从空气流中过滤约5 - 20 nm的雾化SiO2纳米颗粒，同时保持约2.28 - 7.1 x 10（-5）mol m（-2）s-1 Pa-1的空气渗透率。此外，氧等离子体蚀刻时间的系统性增加允许雾化纳米颗粒的可调尺寸选择性过滤。我们展示了一种新的路线，以实现超紧凑，重量轻，和保形的形状因子过滤器能够阻止亚20纳米雾化纳米粒子与生物/病毒威胁缓解特别相关。
Filtering nanoparticulate aerosols from air streams is important for a wide range of personal protection equipment (PPE), including masks used for medical research, healthcare, law enforcement, first responders, and military applications. Conventional PPEs capable of filtering nanoparticles < 300 nm are typically bulky and sacrifice breathability to maximize protection from exposure to harmful nanoparticulate aerosols including viruses -20-300 nm from air streams. Here, we show that nanopores introduced into centimeter-scale monolayer graphene supported on polycarbonate track-etched supports via a facile oxygen plasma etch can allow for filtration of aerosolized SiO2 nanoparticles of -5-20 nm from air steams while maintaining air permeance of -2.28-7.1 x 10(-5) mol m(-2 )s-1 Pa-1. Furthermore, a systematic increase in oxygen plasma etch time allows for a tunable size-selective filtration of aerosolized nanoparticles. We demonstrate a new route to realize ultra-compact, lightweight, and conformal form-factor filters capable of blocking sub-20 nm aerosolized nanoparticles with particular relevance for biological/viral threat mitigation.