Formation of preferentially oriented Cu[111] layer on Nb[110] barrier on SiO2
Formation of preferentially oriented Cu[111] layer on Nb[110] barrier on SiO2
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DOI：
10.1143/jjap.43.l1565
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发表时间：
2004-12-15
期刊：
影响因子：
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通讯作者：
Noya, A
中科院分区：
文献类型：
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作者：
Maniruzzaman, M;Takeyama, MB;Noya, A
在热生长的SiO_2衬底上形成的取向Nb[110]势垒上，获得了择优取向的Cu[111]层。用X射线衍射仪和横截面透射电子显微镜研究了Cu/Nb/SiO_2/Si模型体系的取向和织构特征。X射线极图和欧米伽摇摆曲线测量证实，在取向的Nb[1 1 0]势垒上生长出具有良好马赛克的纤维结构中择优取向的铜[1 1 1]层，其半高宽接近于欧米伽摇摆曲线的3度。透射电子显微镜观察表明，在非晶态SiO_2上取向的Cu和Nb层具有明显的柱状结构，并且由于500℃的热处理织构是稳定的。
A preferentially oriented Cu [1 1 1] layer is obtained on an oriented Nb [1 1 0] barrier formed on thermally grown SiO2. We examine the characteristics of the orientation and textures in the Cu/Nb/SiO2/Si model system by X-ray diffraction analysis and cross-sectional transmission electron microscopy (TEM). It was confirmed by X-ray pole figures and omega-rocking curve measurements that the preferentially oriented Cu [1 1 1] layer in the fiber structure showing a good mosaicity with a full width at half maximum of similar to3degrees in the omega-rocking curve was grown on in oriented Nb [1 1 0] barrier. The TEM observation shows a pronounced columnar structure in the oriented Cu and Nb layers on amorphous SiO2 and the textures are stable due to annealing at 500degreesC.