Fabrication of Polysilane-Silica Hybrid Thin Films with Controlled Refractive Index
Fabrication of Polysilane-Silica Hybrid Thin Films with Controlled Refractive Index
复制标题
折射率可控的聚硅烷-二氧化硅杂化薄膜的制备
DOI：
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发表时间：
2001
期刊：
影响因子：
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通讯作者：
InoueHiroshi
中科院分区：
文献类型：
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作者：
MatsuuraYukihito;MatsukawaKimihiro;InoueHiroshi
采用溶胶-凝胶法，利用共聚物poly[methylphenylsilane-co-(methacryloxypropyltrimethoxysilane)].制备了聚硅烷-二氧化硅杂化薄膜，其中聚硅烷链段被包裹在二氧化硅基质中杂化薄膜由大范围的聚硅烷和二氧化硅组成，没有相分离。不同组份的杂化薄膜的折射率从1.61变化到1.49。它们的折射率随聚硅烷链段在紫外光照射下的降解而降低。
Polysilane–silica hybrid thin films, in which the polysilane segment is encapsulated within the silica matrix, were prepared by a sol–gel method using copolymers, poly[methylphenylsilane-co-(methacryloxypropyltrimethoxysilane)]. The hybrid thin films were composed of a wide range of polysilane and silica ratios without phase separation. The observed refractive index of the hybrid thin film was changed from 1.61 to 1.49 with a different composition ratio. Their refractive indexes were decreased with degradation of polysilane segments on UV irradiation.