Comparison of Different Phonon Transport Models for Predicting Heat Conduction in Silicon-on-Insulator Transistors
Comparison of Different Phonon Transport Models for Predicting Heat Conduction in Silicon-on-Insulator Transistors
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DOI:
10.1115/1.1924571
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发表时间:
2005-07
影响因子:
--
通讯作者:
S. Narumanchi;J. Murthy;C. Amon
中科院分区:
文献类型:
--
作者:
S. Narumanchi;J. Murthy;C. Amon
The problem of self-heating in microelectronic devices has begun to emerge as a bottleneck to device performance. Published models for phonon transport in microelectronics have used a gray Boltzmann transport equation (BTE) and do not account adequately for phonon dispersion or polarization. In this study, the problem of a hot spot in a submicron silicon-on-insulator transistor is addressed. A model based on the BTE incorporating full phonon dispersion effects is used. A structured finite volume approach is used to solve the BTE. The results from the full phonon dispersion model are compared to those obtained using a Fourier diffusion model. Comparisons are also made to previously published BTE models employing gray and semi-gray approximations. Significant differences are found in the maximum hot spot temperature predicted by the different models. Fourier diffusion underpredicts the hot spot temperature by as much as 350% with respect to predictions from the full phonon dispersion model. For the full phonon dispersion model, the longitudinal acoustic modes are found to carry a majority of the energy flux. The importance of accounting for phonon dispersion and polarization effects is clearly demonstrated.