Low-temperature synthesis of highly hydrophilic Ti-containing mesoporous silica thin films on polymer substrates by photocatalytic removal of structure-directing agents
Low-temperature synthesis of highly hydrophilic Ti-containing mesoporous silica thin films on polymer substrates by photocatalytic removal of structure-directing agents
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DOI：
10.1039/c0jm01404d
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发表时间：
2011
影响因子：
--
通讯作者：
Yu Horiuchi;H. Ura;T. Kamegawa;K. Mori;H. Yamashita
中科院分区：
文献类型：
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作者：
Yu Horiuchi;H. Ura;T. Kamegawa;K. Mori;H. Yamashita
本文介绍了一种在室温下紫外光催化脱除结构导向剂（SDA）制备高亲水性多孔薄膜的新方法。由于这种技术不需要煅烧过程，它可以有效地涂覆具有低热阻的表面，如聚合物基板。在本研究中，采用紫外辐照的新方法在聚碳酸酯和石英衬底上制备了含钛介孔二氧化硅薄膜（Ti-MSTF）。通过水接触角测量研究了膜的表面润湿性。紫外照射下FT-IR光谱的时间依赖性变化证实了SDA的完全去除，这也表明介孔二氧化硅骨架中的ti -氧化物部分在SDA的去除中起着至关重要的作用。XRD、UV-vis和XAFS测试表明，Ti-MSTF具有介孔结构和分离的ti -氧化物基团。水接触角测量结果表明，光催化去除SDA后，Ti-MSTF表现出高度亲水性，并在黑暗条件下保持该性能数天。
This article describes a novel preparation method for highly hydrophilic porous thin films via photocatalytic removal of a structure-directing agent (SDA) under UV-light irradiation at ambient temperature. Since this technique requires no calcination process, it can effectively coat surfaces that have low thermal resistance, such as polymer substrates. In the present study, Ti-containing mesoporous silica thin films (Ti-MSTF) were prepared on polycarbonate and quartz substrates using a newly developed method involving UV-light irradiation. The film surface wettabilities were investigated by water contact angle measurements. Complete removal of the SDA was confirmed by time-dependent changes in the FT-IR spectra under UV-light irradiation, which also suggested that Ti-oxide moieties in the mesoporous silica framework play a crucial role in the removal of the SDA. XRD, UV-vis and XAFS measurements revealed that the Ti-MSTF had a mesoporous structure and isolated Ti-oxide moieties. The water contact angle measurements indicated that the Ti-MSTF exhibited highly hydrophilic property after photocatalytic removal of the SDA, and maintained this property under dark conditions for several days.