Micromachined, silicon based electrode arrays for electrical stimulation of or recording from cerebral cortex
Micromachined, silicon based electrode arrays for electrical stimulation of or recording from cerebral cortex
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用于大脑皮层电刺激或记录的微机械硅基电极阵列
DOI：
10.1109/memsys.1991.114805
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发表时间：
1991
期刊：
影响因子：
--
通讯作者：
K. E. Jones
中科院分区：
文献类型：
--
作者：
R. Normann;P. Campbell;K. E. Jones
先前的工作表明，通过穿透电极对视觉皮层进行电刺激可能是为盲人提供功能性视觉的可行方法。这一概念的关键是开发一种三维微结构，其中包含一系列旨在插入视觉皮层的电极。这样的结构已经创建，电极设计为穿透1.5毫米到视觉皮层。该阵列由100根针组成，每根针长1.5 mm，基部一侧长0.08 mm。针，从0.2毫米厚，4.2毫米 *4.2毫米的硅基板出现，有中心到中心的间距为0.4毫米。制造方法包括初步成型与计算机控制的金刚石切割锯和最终成型和抛光两步化学蚀刻过程。研究这些硅结构在皮质组织中的生物相容性的初步工作表明，皮质耐受植入和阵列中使用的材料非常好。<<ETX>>
Previous work has indicated that electrical stimulation of the visual cortex via penetrating electrodes may be a viable approach to providing a functional visual sense for the blind. Key to this concept is the development of a three-dimensional microstructure that contains an array of electrodes intended to be inserted into the visual cortex. Such a structure has been created, with electrodes designed to penetrate 1.5 mm into the visual cortex. The array consists of 100 needles, each of which is 1.5 mm long and 0.08 mm on a side at its base. The needles, which emerge from a 0.2 mm thick, 4.2 mm*4.2 mm silicon substrate, have center to center spacings of 0.4 mm. The fabrication methodologies consist of preliminary shaping with a computer-controlled diamond dicing saw and final shaping and polishing with a two-step chemical etching process. Preliminary work to investigate the biocompatibility of these silicon structures in cortical tissues indicates that the cortex tolerates implantation and the materials used in the arrays very well.<<ETX>>