Catalytic in situ generation of Zn(II)-alkynilides under mild conditions:: A novel C=N addition process utilizing terminal acetylenes
Catalytic in situ generation of Zn(II)-alkynilides under mild conditions:: A novel C=N addition process utilizing terminal acetylenes
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DOI:
10.1021/ja993074n
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发表时间:
1999-12-08
影响因子:
15
通讯作者:
Carreira, EM
中科院分区:
文献类型:
--
作者:
Frantz, DE;Fässler, R;Carreira, EM
The discovery and study of new stoichiometric and catalytic reactions that lead to CC bond formation by additions to CdO or CdN are of fundamental importance in the continuing development of efficient processes for chemical synthesis. Metalated terminal alkynes are an ideal class of versatile nucleophiles that add to a wide range of electrophiles, affording adducts of great synthetic versatility. 1, 2 The alkynilides typically employed in such processes are commonly prepared from an acetylene and organolithium (ie, BuLi) 3 or organomagnesium bases (ie, EtMgBr). 4 Because the aldehydes and imines used are incompatible with such basic and nucleophilic reagents, alkyne deprotonation must necessarily be carried out as a separate step. 5 The ability to carry out nucleophilic additions of alkynes to CdO or CdN without the use of such strong, pyrophoric, stoichiometric bases would lead to great simplification of the processes. 6 Of greater importance, the catalytic generation of reactive transitionmetal alkynilides from the corresponding terminal alkyne in situ under conditions that are compatible with electrophilic reaction partners would provide fresh avenues for the development of new, efficient asymmetric processes leading to CC bond-formation. In this contribution, we document our observations involving the addition of terminal alkynes to nitrones in the presence of both catalytic transition-metal and base, 10 mol% Zn (OTf) 2 in combination with 25 mol% iPr2NEt (eq 1), under mild conditions (23 C). The reaction is observed to work well with N-benzyl nitrones and a broad range of terminal acetylenes including enynes, trimethylsilyl acetylene, propargyl trimethylsilane, as well as propargyl bromide.