Development of Al-based multilayer optics for EUV
Development of Al-based multilayer optics for EUV
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DOI：
10.1007/s00339-009-5445-2
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发表时间：
2009
期刊：
影响因子：
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通讯作者：
E. Meltchakov;C. Hecquet;M. Roulliay;S. Rossi;Y. Ménesguen;A. Jérôme;F. Bridou;F. Varnière;M. Ravet-Krill;F. Delmotte
中科院分区：
文献类型：
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作者：
E. Meltchakov;C. Hecquet;M. Roulliay;S. Rossi;Y. Ménesguen;A. Jérôme;F. Bridou;F. Varnière;M. Ravet-Krill;F. Delmotte
我们报道了极紫外（EUV）波段多层膜光学器件的发展。讨论了铝基多层膜反射镜的光学性能，包括反射率和选择性，以及这种多层膜的界面粗糙度问题。我们证明了通过引入额外的金属层（W或Mo）而不是在每个界面处沉积缓冲层来降低平均粗糙度的可能性。我们已经制备和测试了Al/SiC，Al/W/SiC和Al/Mo/SiC多层膜的各种周期的光谱范围从15到40 nm，这是高次谐波产生，同步辐射和天体物理学的兴趣越来越大的范围。三组分系统的结构已被优化，以获得光谱范围内的每个波长的最佳反射率。我们已经表明，在铝基周期性叠层中引入难熔金属可以改善为EUV应用设计的多层反射涂层的光学性能。
We report on the development of multilayer optics for the extreme ultra-violet (EUV) range. The optical performance of Al-based multilayer mirrors is discussed with regard to promising reflectivity and selectivity characteristics and the problems of the interfacial roughness for this type of multilayers. We demonstrate a possibility to reduce the average roughness by introducing additional metal layer (W or Mo) rather than depositing a buffer layer at each interface. We have prepared and tested Al/SiC, Al/W/SiC and Al/Mo/SiC multilayers of various periods for the spectral range from 15 to 40 nm, which is the range of increasing interest for high-order harmonic generation, synchrotron radiation and astrophysics. The structure of the three-component systems has been optimized in order to obtain the best reflectivity for each wavelength within the spectral range. We have shown that introduction of refractory metal in Al-based periodic stack can improve the optical performance of multilayer reflecting coatings designed for the EUV applications.