Selective growth of Ruddlesden-Popper strontium iridate epitaxial films by controlling oxygen partial pressure in pulsed laser deposition
Selective growth of Ruddlesden-Popper strontium iridate epitaxial films by controlling oxygen partial pressure in pulsed laser deposition
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通过控制脉冲激光沉积中的氧分压选择性生长 Ruddlesden-Popper 铱酸锶外延膜
DOI：
10.1016/j.matlet.2017.05.063
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发表时间：
2017-09
影响因子：
3
通讯作者：
Chun-Gang Duan
中科院分区：
文献类型：
--
作者：
Bin-Jie Chen;Nan Yang;Ni Zhong;Xiao-Dong Tang;Ping-Xiong Yang;Ping-Hua Xiang;Chun-Gang Duan
采用脉冲激光沉积的方法，从单一的Sr2IrO4靶上选择性地生长了Ruddlesden-Popper(RP)型Ir酸锶(SrIrO3和Sr2IrO4)外延薄膜。SrIrO_3和Sr2IrO_4相的稳定化对氧分压(PO2)很敏感。较低的激光通量有利于扩大纯Sr2IrO4薄膜的生长窗口。较低的氧分压(≤2.6pA)是制备Sr2IrO4薄膜的首选，而在较高的氧分压(≥6.5pA)时形成了SrIrO3相。总结了SrIrO_3和Sr2IrO_4薄膜的生长曲线，为制备单一的RP型Ir酸锶外延薄膜提供了有力的指导。
The Ruddlesden-Popper (RP)-type strontium iridate (SrIrO3and Sr2IrO4) epitaxial thin films are selectively grown from a single Sr2IrO4target using pulsed laser deposition. The stabilization of the SrIrO3and Sr2IrO4phase is sensitive to oxygen partial pressure (PO2). Low laser fluence tends to expand the growth window of pure Sr2IrO4films. The lower PO2(≤2.6 Pa) is preferred for preparing Sr2IrO4films, while the SrIrO3phase forms at higher PO2(≥6.5 Pa). The growth diagram for SrIrO3and Sr2IrO4films has been summarized, providing a powerful guideline for fabricating the epitaxial films of single RP-type strontium iridate phase.
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影响因子：
3.7
作者：
C. Serrao;Jian Liu;J. Heron;G. Singh-Bhalla;A. Yadav;S. Suresha;R. J. Paull;D. Yi;J. Chu;M. Trassin;A. Vishwanath;E. Arenholz;C. Frontera;J. vZelezn'y;T. Jungwirth;X. Marti;R. Ramesh
通讯作者：
C. Serrao;Jian Liu;J. Heron;G. Singh-Bhalla;A. Yadav;S. Suresha;R. J. Paull;D. Yi;J. Chu;M. Trassin;A. Vishwanath;E. Arenholz;C. Frontera;J. vZelezn'y;T. Jungwirth;X. Marti;R. Ramesh
影响因子：
3.2
作者：
Biswas, Abhijit;Kim, Ki-Seok;Jeong, Yoon Hee
通讯作者：
Jeong, Yoon Hee
影响因子：
3.7
作者：
L. Miao;Hong Xu;Z. Mao
通讯作者：
L. Miao;Hong Xu;Z. Mao
影响因子：
3.2
作者：
J. Zhao;L. Yang;Yunjin Yu;F. Y. Li;R. Yu;Z. Fang;Liu-Cheng Chen;C. Jin
通讯作者：
J. Zhao;L. Yang;Yunjin Yu;F. Y. Li;R. Yu;Z. Fang;Liu-Cheng Chen;C. Jin
影响因子：
5.4
作者：
M. A. Subramanian;M. Crawford;R. Harlow
通讯作者：
M. A. Subramanian;M. Crawford;R. Harlow