An ultrasmall angle scattering instrument for the DORIS‐III bypass

An ultrasmall angle scattering instrument for the DORIS‐III bypass
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用于 DORIS-III 旁路的超小角散射仪

DOI:
10.1063/1.1142730
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发表时间:
1992
影响因子:
1.6
通讯作者:
R. Gehrke
R. Gehrke
中科院分区:
工程技术4区
文献类型:
--
作者:
R. Gehrke

文献摘要

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通过光线追迹和有限元计算研究了DORIS‐III摆动器束线BW 4上新型小角X射线散射仪的光学系统布局。计算了光束线上不同位置,特别是焦平面上的绝对光强分布。双晶单色器的第一晶体是受热负荷影响最大的光学元件。因此,该晶体表面的变形由于热负荷以及预期的冷却系统被考虑在内。结果表明,由于这种畸变,焦点处的光子通量密度降低了0.2倍。
The layout of the optics for a new small angle x‐ray scattering instrument at the DORIS‐III wiggler beamline BW4 was investigated by means of ray tracing and finite element calculations. The absolute intensity distributions at different locations of the beamline, especially in the focal plane, have been computed. The first crystal of a double crystal monochromator is the optical element that is most strongly influenced by thermal load. Thus, the distortion of this crystal surface due to thermal load was taken into account as well as the intended cooling system. The results show that the photon flux density at the focus is decreased by a factor of 0.2 due to this distortion.