Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates
Plasmonic and Mie scattering control of far-field interference for regular ripple formation on various material substrates
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DOI：
10.1364/oe.19.019093
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发表时间：
2011-09-26
期刊：
影响因子：
3.8
通讯作者：
Obara, Minoru
中科院分区：
文献类型：
--
作者：
Obara, Go;Maeda, Naoki;Obara, Minoru
我们给出了等离子体控制半导体和金属上规则波纹形成的远场干涉的实验和理论结果。实验观察了飞秒激光照射下金纳米球在硅衬底上产生的干涉波纹。金纳米球被发现是波纹形成的根源。通过沉积所需的等离子体激元和Mie散射远场图案发生器，理论上可以控制任意强度的波纹图案。等离子体远场的产生不仅表现在金属纳米结构上，还表现在各种材料衬底上受控制的表面结构，如脊状结构和沟槽结构。(C)2011年美国光学学会
We present experimental and theoretical results on plasmonic control of far-field interference for regular ripple formation on semiconductor and metal. Experimental observation of interference ripple pattern on Si substrate originating from the gold nanosphere irradiated by femtosecond laser is presented. Gold nanosphere is found to be an origin for ripple formation. Arbitrary intensity ripple patterns are theoretically controllable by depositing desired plasmonic and Mie scattering far-field pattern generators. The plasmonic far-field generation is demonstrated not only by metallic nanostructures but also by the controlled surface structures such as ridge and trench structures on various material substrates. (C) 2011 Optical Society of America