In situ nanoindentation measurements of arc-evaporated Cr0.49Al0.51N, Al0.66Ti0.34N, and Al0.65Ti0.33Y0.02N films up to 800 °C

In situ nanoindentation measurements of arc-evaporated Cr0.49Al0.51N, Al0.66Ti0.34N, and Al0.65Ti0.33Y0.02N films up to 800 °C
复制标题

在高达 800 °C 的温度下对电弧蒸发 Cr0.49Al0.51N、Al0.66Ti0.34N 和 Al0.65Ti0.33Y0.02N 薄膜进行原位纳米压痕测量

DOI:
10.1116/1.5138723
复制
发表时间:
2020-01
期刊:
Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
影响因子:
--
通讯作者:
Kim Kwang Ho
Kim Kwang Ho
中科院分区:
其他
文献类型:
--
作者:
Wu Zhengtao;Wang Qimin;Kim Kwang Ho

文献摘要

相似文献

在这项研究中,在原位硬度和弹性模量测量电弧蒸发的Cr0.49Al0.51N,Al0.66Ti0.34N,和Al0.65Ti0.33Y0.02N薄膜使用高温纳米压痕仪进行了研究。发现Cr0.49Al0.51N的硬度在室温(RT)下从30.2 ± 2.3 GPa开始增加,在600 °C下达到最大值33.2 ± 2.4 GPa,然后在800 °C下降低到27.9 ± 2.1 GPa。然而,弹性模量随温度变化的结果遵循降低的趋势,RT为405 ± 23 GPa,在800 °C时降低至280 ± 18 GPa。Al 0.66Ti 0.34N和Al 0.65Ti 0.33Y 0.02N薄膜的硬度和弹性模量均随温度的升高而增加。Y的加入有效地提高了Al 0.66Ti 0.34N合金的硬度和室温-300 °C的弹性模量。然而,在300-800 °C,硬度和弹性模量略有变化,因为Y被纳入。在这项研究中,在原位硬度和弹性模量测量电弧蒸发的Cr0.49Al0.51N,Al0.66Ti0.34N,和Al0.65Ti0.33Y0.02N薄膜使用高温纳米压痕测试仪进行了研究。发现Cr0.49Al0.51N的硬度在室温(RT)下从30.2 ± 2.3 GPa开始增加,在600 °C下达到最大值33.2 ± 2.4 GPa,然后在800 °C下降低到27.9 ± 2.1 GPa。然而,弹性模量随温度变化的结果遵循降低的趋势,RT为405 ± 23 GPa,在800 °C时降低至280 ± 18 GPa。Al 0.66Ti 0.34N和Al 0.65Ti 0.33Y 0.02N薄膜的硬度和弹性模量均随温度的升高而增加。Y的加入有效地提高了Al 0.66Ti 0.34N合金的硬度和室温-300 °C的弹性模量。然而,在300-800 °C下,随着Y的掺入,硬度和弹性模量都略有变化。
In this study, the in situ hardness and elastic modulus measurements of arc-evaporated Cr0.49Al0.51N, Al0.66Ti0.34N, and Al0.65Ti0.33Y0.02N films are investigated using a high-temperature nanoindentation tester. It is found that the hardness of Cr0.49Al0.51N initially increases from 30.2 ± 2.3 GPa at room temperature (RT) and reaches a maximum of 33.2 ± 2.4 GPa at 600 °C before decreasing to 27.9 ± 2.1 GPa at 800 °C. However, the results for elastic modulus versus temperature follow a degraded trend, with 405 ± 23 GPa for RT, decreasing to 280 ± 18 GPa at 800 °C. Increases in the hardness and the elastic modulus can be achieved for both Al0.66Ti0.34N and Al0.65Ti0.33Y0.02N films as their temperatures increase. The addition of Y effectively promotes the hardness and the elastic modulus of Al0.66Ti0.34N at RT–300 °C. However, both hardness and elastic modulus change slightly as Y is incorporated at 300–800 °C.In this study, the in situ hardness and elastic modulus measurements of arc-evaporated Cr0.49Al0.51N, Al0.66Ti0.34N, and Al0.65Ti0.33Y0.02N films are investigated using a high-temperature nanoindentation tester. It is found that the hardness of Cr0.49Al0.51N initially increases from 30.2 ± 2.3 GPa at room temperature (RT) and reaches a maximum of 33.2 ± 2.4 GPa at 600 °C before decreasing to 27.9 ± 2.1 GPa at 800 °C. However, the results for elastic modulus versus temperature follow a degraded trend, with 405 ± 23 GPa for RT, decreasing to 280 ± 18 GPa at 800 °C. Increases in the hardness and the elastic modulus can be achieved for both Al0.66Ti0.34N and Al0.65Ti0.33Y0.02N films as their temperatures increase. The addition of Y effectively promotes the hardness and the elastic modulus of Al0.66Ti0.34N at RT–300 °C. However, both hardness and elastic modulus change slightly as Y is incorporated at 300–800 °C.