Friction fade-out at polymer-like carbon films slid by ZrO2 pins under hydrogen environment

Friction fade-out at polymer-like carbon films slid by ZrO2 pins under hydrogen environment
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DOI:
10.1177/1350650115569857
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发表时间:
2015-01
期刊:
Proceedings of the Institution of Mechanical Engineers, Part J: Journal of Engineering Tribology
影响因子:
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通讯作者:
M. Nosaka;Akira Mifune;M. Kawaguchi;Takashi Shiiba;Takahisa Kato
M. Nosaka;Akira Mifune;M. Kawaguchi;Takashi Shiiba;Takahisa Kato
中科院分区:
其他
文献类型:
--
作者:
M. Nosaka;Akira Mifune;M. Kawaguchi;Takashi Shiiba;Takahisa Kato

文献摘要

相似文献

在H2/He混合气体和纯H2气体环境下,用陶瓷销与完全氢化的类金刚石(PLC)膜进行摩擦试验。ZrO 2(YSZ:氧化钇稳定的氧化锆)销在PLC膜上滑动,施加4.9N的载荷的试验结果表明,摩擦系数下降到摩擦计噪声水平(摩擦衰减,FFO)低至0.0002。在另一个实验中,使用相同的材料,施加30.4 N的载荷,摩擦系数下降到0.0001-0.0005,持续超过4小时。光学显微镜和扫描电子显微镜观察,纳米压痕,表面轮廓仪,X射线光电子能谱,拉曼,和飞行时间二次离子质谱测量进行和邀请FFO的机制进行了研究。通过光学显微镜观察发现,转移膜有小气泡,表明在ZrO 2表面产生了一些气态物质。根据测量结果讨论了ZrO 2催化对PLC和转移膜表面的气态物质产生和H钝化起着非常重要的作用,这分别通过气体润滑作用和降低粘附力与FFO密切相关。
Friction tests using ceramic pins against fully hydrogenated diamond-like carbon (polymer-like carbon, PLC) film under H2/He mixed gas or pure H2 gas environment were conducted. The test results of ZrO2 (YSZ: yttria-stabilized zirconia) pin slid against PLC film with an applied load of 4.9 N showed that the friction coefficient dropped to the tribometer noise level (friction fade-out, FFO) as low as 0.0002. In another experiment with the same materials and with an applied load of 30.4 N, the friction coefficient dropped to 0.0001–0.0005, which continued more than 4 h. Optical microscope and scanning electron microscopic observations, nano-indentation, surface profiler, X-ray photoelectron spectroscopy, Raman, and time-of-flight secondary ion mass spectrometry measurements were conducted and the mechanism for inviting FFO is investigated. It is found by an optical microscopic observation that the transfer film has small blisters, indicating some gaseous substance is generated at the ZrO2 surface. It is discussed based on the measurements that ZrO2 catalysis plays very important roles for gaseous substances generation and for H-passivation on both PLC and transfer film surfaces, which are closely relating to FFO through gas-lubrication effect, and through reducing adhesive force, respectively.