Deposition of Tungsten – Tantalum composite coating on RAFM steel by sputtering deposition process
Deposition of Tungsten – Tantalum composite coating on RAFM steel by sputtering deposition process
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DOI：
10.1016/j.fusengdes.2020.111972
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发表时间：
2020-11
影响因子：
1.7
通讯作者：
S. Konuru;U. V;A. Sarma
中科院分区：
文献类型：
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作者：
S. Konuru;U. V;A. Sarma
采用磁控溅射法在低活化铁素体马氏体钢（RAFM）表面制备了钨钽复合涂层，并对影响涂层附着力的工艺参数进行了分析。以薄膜附着力为目标，采用田口正交表优化了合适的中间层选择和工艺参数。钨被用来建立初步的工艺参数和合适的中间层材料。采用优化后的工艺参数和中间层材料，在Ta含量为5%~ 20%的范围内制备了W-Ta复合薄膜。在本研究中，W和W-Ta薄膜的最大沉积速率分别达到18 nm/min和16 nm/min。结果表明，在350 °C下沉积的含5%Ta的复合镀层与Cr中间层的结合力最好，形貌最好。通过划痕试验、洛氏压痕试验、场发射扫描电镜和能谱分析，研究了W和W-Ta复合薄膜的附着力、形貌特征和化学成分。
Tungsten – Tantalum composite coatings on Reduced Activation Ferritic Martensitic Steel (RAFM) for plasma-facing applications in a Tokamak, are prepared by magnetron sputtering deposition in this study, and the parameters that influence thin-film adhesion are analysed. Thin film adhesion as the objective, the suitable interlayer selection and process parameters were optimized using Taguchi orthogonal array. Tungsten was used to establish the process parameters and suitable interlayer material initially. The optimized parameters and interlayer material were subsequently used for depositing W-Ta composite film varying the Ta percentage from 5% to 20 %. Deposition rate of maximum 18 nm/min and 16 nm/min were achieved for W and W-Ta thin films respectively in this study. It is concluded that 5% Ta composite film, when deposited with Cr interlayer at 350 °C, has the best adhesion and morphological properties compared to other coatings. Adhesion, morphological features, and chemical analysis of W and W-Ta composite thin films studied by scratch test, Rockwell Indentation test, FESEM, and EDS analysis.