The Possibility of Carbonyl Fluoride as a New CVD Chamber Cleaning Gas
The Possibility of Carbonyl Fluoride as a New CVD Chamber Cleaning Gas
复制标题
碳酰氟作为新型 CVD 室清洁气体的可能性
DOI：
10.1149/1.1669010
复制
发表时间：
2004
影响因子：
3.9
通讯作者：
T. Beppu
中科院分区：
文献类型：
--
作者：
Y. Mitsui;Y. Ohira;T. Yonemura;T. Takaichi;A. Sekiya;T. Beppu
研究了碳酰氟（COF2）作为等离子体增强化学气相沉积（PECVD）腔室清洁的替代气体，以减少半导体制造中清洁过程中的温室气体排放。利用实验等离子体工具评价了COF2的清洁性能及其排放气体的环境影响。结果表明，COF2的清洗性能与常规C2F6相当.此外，证实了COF 2的使用相对于C 2 F 6的使用能够使全球变暖排放减少95%以上，因此COF 2被认为是有前景的替代清洁气体。
Carbonyl fluoride (COF 2 ) has been investigated as an alternative gas for plasma-enhanced chemical vapor deposition (PECVD) chamber cleaning in order to reduce greenhouse gases emitted from the cleaning process in semiconductor manufacturing. The cleaning performance of COF 2 and the environmental impact of its exhaust gases were evaluated using an experimental plasma tool. The results indicated that the cleaning performance of COF 2 was equivalent to that of conventional C 2 F 6 . Furthermore, it was confirmed that the use of COF 2 would enable the reduction of global warming emissions by over 95% relative to the use of C 2 F 6 , and thus COF 2 is considered to be a promising alternative cleaning gas.