STUDY AND IMPROVEMENT OF THE ADHESION OF CHROMIUM THIN-FILMS DEPOSITED BY MAGNETRON SPUTTERING
STUDY AND IMPROVEMENT OF THE ADHESION OF CHROMIUM THIN-FILMS DEPOSITED BY MAGNETRON SPUTTERING
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DOI：
10.1016/0040-6090(94)06360-5
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发表时间：
1995-03-15
期刊：
影响因子：
2.1
通讯作者：
MACHET, J
中科院分区：
文献类型：
--
作者：
GUILBAUDMASSEREAU, V;CELERIER, A;MACHET, J
采用磁控溅射法在玻璃基体上沉积纯铬和掺杂铬涂层。通过改变反应气体的含量，观察到拉伸的本征应力转变为压缩的。划痕试验表明，掺杂铬涂层在压缩状态下具有良好的附着力。掺杂的氮铬膜具有最高值的临界载荷，在该临界载荷下，粘附失败（17 N）。纯铬涂层处于拉应力状态，临界值仅为11N.附着力和内在应力的依赖性。这些结果与平均晶粒尺寸、择优晶向、形貌和显微硬度有关。
Pure and doped chromium coatings are deposited on glass substrates by magnetron sputtering. By varying the reactive gas content, tensile intrinsic stress transitions to compressive ones are observed. Scratch tests have demonstrated a good adhesion for doped chromium coatings which are in a compressive state. Doped nitrogen chromium films have the highest values of the critical load at which adhesion fails (17 N). Pure chromium coatings are in tensile stresses and the critical value is only 11 N. Adhesion and intrinsic stress dependences are shown. These results are correlated with average crystallographic grain size, preferential crystalline orientation, morphology and microhardness.