Controllable modification of SiC nanowires encapsulated in BN nanotubes

Controllable modification of SiC nanowires encapsulated in BN nanotubes
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DOI:
10.1002/adma.200401266
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发表时间:
2005-03-08
期刊:
影响因子:
29.4
通讯作者:
Golberg, D
Golberg, D
中科院分区:
材料科学1区
文献类型:
--
作者:
Li, YB;Dorozhkin, PS;Golberg, D

文献摘要

被引文献

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用化学气相沉积法制备了包裹在BN纳米管中的半导体β-碳化硅纳米线(见图)。一个不同寻常的特征--BN管内壁和碳化硅纳米线之间宽度为10-15 nm的间隙--允许对纳米线进行各种化学和形态修饰。
Semiconducting beta-SiC nanowires encapsulated in BN nanotubes are prepared using chemical vapor deposition (see Figure). An unusual feature-a gap of 10-15 nm in width between the inner wall of the BN tube and the SiC nanowire-allows various chemical and morphological modifications to be performed on the nanowires.