K. Sasaki, T. Hata: "Reactive Growth of YSZ(ZrO2:Y2O3) Thin Films with Unpoisoned Sputtering Target"Abs. Of Joint Workshop of 29th IUVSAT. 59-62 (2000)
K. Sasaki, T. Hata: "Reactive Growth of YSZ(ZrO2:Y2O3) Thin Films with Unpoisoned Sputtering Target"Abs. Of Joint Workshop of 29th IUVSAT. 59-62 (2000)
复制标题
K. Sasaki、T. Hata:“使用无毒溅射靶材反应生长 YSZ(ZrO2:Y2O3) 薄膜”Abs。
DOI:
--
复制
发表时间:
--
期刊:
影响因子:
--
通讯作者:
中科院分区:
文献类型:
--
作者: