Hillocks, Pits, and Etch Rate in Germanium Crystals
Hillocks, Pits, and Etch Rate in Germanium Crystals
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锗晶体中的小丘、凹坑和蚀刻速率
DOI：
10.1063/1.1722624
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发表时间：
1957
影响因子：
3.2
通讯作者：
B. Batterman
中科院分区：
文献类型：
--
作者：
B. Batterman
在暴露于H2O2-HF（过氧化氢）蚀刻剂的某些锗表面取向上观察到对称的刻面丘。考虑到表面曲率和蚀刻速率，可以得出结论：在蚀刻速率与取向表面上，边界小丘的面必须位于鞍点处。对整个立体三角形蚀刻速率的测量支持了这一结论。从表面蚀刻速率随取向变化的角度讨论了位错坑和位错丘的形成。
Symmetric faceted etch hillocks have been observed on certain germanium surface orientations exposed to an H2O2–HF (Superoxol) etchant. Considerations of surface curvature and etch rate lead to the conclusion that the faces bounding the hillocks must be at saddle points on an etch rate vs orientation surface. A measurement of etch rate throughout the stereographic triangle has supported this conclusion. The formation of dislocation pits and hillocks is discussed in terms of the variation of surface etch rate with orientation.