Deterministic Dual Control of Phase Competition in Strained BiFeO3: A Multiparametric Structural Lithography Approach
Deterministic Dual Control of Phase Competition in Strained BiFeO3: A Multiparametric Structural Lithography Approach
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DOI：
10.1007/s41871-021-00123-5
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发表时间：
2021-12
影响因子：
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通讯作者：
Nathan Black;David Edwards;N. Browne;J. Guy;Niyorjyoti Sharma;Kristina M. Holsgrove;A. Naden;
中科院分区：
文献类型：
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作者：
Nathan Black;David Edwards;N. Browne;J. Guy;Niyorjyoti Sharma;Kristina M. Holsgrove;A. Naden;
在应变BiFeO_3(BFO)薄膜中实现了混合相微结构，导致了由类四方单斜相(T相)和类三方单斜相(R相)共存产生的许多新的效应。相之间强烈的应变和极化差异应该导致高水平的相变塑性，这使得R和T状态的相对比例能够随着外力的响应而不断变化。尽管利用这种可塑性在外部刺激下控制混合相种群的潜力是显而易见的，但得到平衡预测支持的直接实验证据尚未得到充分证明。在这里，我们展示了外延应变BFO薄膜中混合相布居的确定性控制，通过以可逆的方式施加局部应力和电场。结果表明，应变BFO薄膜中混合相的确定性控制是合理的，这可能是调节其功能性质的关键。这些发现还突出了扫描探针光刻工具箱中的一种新的多参数技术，该技术基于针尖辅助的电场和应变场对功能特性的操纵，可能会在铁电领域和结构相光刻之外得到应用。
The realization of a mixed-phase microstructure in strained BiFeO3(BFO) thin films has led to numerous novel effects derived from the coexistence of the tetragonal-like monoclinic phase (T phase) and rhombohedral-like monoclinic phase (R phase). Strong strain and polarization differences between the phases should result in a high level of transformation plasticity, which enables the continuous alteration of the relative proportion of R and T states in response to external forces. Although the potential for utilizing such plasticity to control mixed-phase populations under external stimuli is evident, direct experimental evidence backed by equilibrium predictions has not yet been fully demonstrated. Here we demonstrate deterministic control of mixed-phase populations in an epitaxially strained BFO thin film through the application of localized stresses and electric fields in a reversible manner. The results illustrate and rationalize deterministic control of mixed phases in strained BFO films, which could be crucial in tuning their functional properties. The findings also highlight a new multiparametric technique in the scanning probe lithography toolbox based on tip-assisted electric and strain field manipulation of functional properties that might find application beyond the ferroelectric domain and structural phase lithography.