Fabrication of domain-inverted gratings in MgO:LiNbO_3 by applying voltage under ultraviolet irradiation through photomask at room temperature
Fabrication of domain-inverted gratings in MgO:LiNbO_3 by applying voltage under ultraviolet irradiation through photomask at room temperature
复制标题
室温光掩模紫外照射电压制备MgO:LiNbO_3反转畴光栅
DOI:
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发表时间:
2003
期刊:
影响因子:
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通讯作者:
T.Suhara
中科院分区:
文献类型:
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作者:
M.Fujimura;T.Sohmura;T.Suhara
DOI:
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发表时间:
1997
期刊:
影响因子:
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作者:
Shinichiro Sonoda;Isao Tsuruma;M. Hatori
通讯作者:
M. Hatori
影响因子:
1.5
作者:
Bing Zhou;Chang;Bo Chen;Y. Nihei;A. Harada;Xiufeng Yang;Chao Lu
通讯作者:
Chao Lu