Fabrication of TiO2 thin films with both anatase and rutile structures together using the ion-implantation method
Fabrication of TiO2 thin films with both anatase and rutile structures together using the ion-implantation method
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采用离子注入法制备同时具有锐钛矿和金红石结构的 TiO2 薄膜
DOI：
10.1364/ome.8.000532
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发表时间：
2018-03-01
影响因子：
2.8
通讯作者：
Ruan, Shuang-Chen
中科院分区：
文献类型：
--
作者：
Ma, Yu-Jie;Lu, Fei;Ruan, Shuang-Chen
离子注入法可以同时制备出金红石型和金红石型交替结构的TiO 2薄膜，具有广泛的应用前景。通过改变注入参数，可以调节金红石和金红石薄膜的厚度，获得纳米级厚度的薄膜。用低能高注量He ~+离子在金红石型TiO_2单晶中形成了厚度约为13 nm的非晶TiO_2薄膜，经热处理后，该非晶相转变为金红石相，甚至金红石相。采用扫描电子显微镜（SEM）和原子力显微镜（AFM）观察了TiO 2薄膜的表面形貌。TEM和拉曼散射技术证实了TiO 2薄膜随温度升高的相变过程。还解释了使用离子注入方法的具有金红石相和金红石相的TiO 2薄膜的组合的设计。
The ion-implantation method can fabricate TiO2 thin films of anatase and rutile structures in an alternate sequence together so that a wide range of applications can be realized. By changing the implantation parameters, the thickness of anatase and rutile thin films can be modulated, and films with a thickness of nano-scale can be achieved. An amorphous TiO2 thin film with a thickness of 13nm was formed in a rutile TiO2 single crystal by low energy He+ ions with high fluences, and this amorphous phase transformed to an anatase and even a rutile phase with thermal treatments. SEM and AFM were used to observe the surface morphology of TiO2 thin film. TEM and Raman scattering techniques confirmed the phase transition process in TiO2 thin films with temperature increase. The design of a combination of TiO2 thin films with both anatase and rutile phases together using the ion-implantation method is also explained.