Introduction of PIXE analysis system in NIRS
Introduction of PIXE analysis system in NIRS
复制标题
NIRS中PIXE分析系统的介绍
DOI：
10.1142/s0129083500000122
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发表时间：
2000
期刊：
影响因子：
--
通讯作者：
M. Yukawa
中科院分区：
文献类型：
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作者：
H. Imaseki;M. Yukawa
1999年3月，静电加速器Tandetron（型号4117 MC，High Voltage Engineering Europe Co.）安装在静电加速器大楼中，用于PIXE（粒子诱导X射线发射）分析。加速电压为0.4 ~ 1.7MV，最大束流为5μA（3.4MeV）。该系统有三个光束端口，用于不同类型的PIXE分析：正常，微束和空气中。第一个射束端口用于正常PIXE。由于这里有Si（Li）和CdZnTe两种类型的X射线检测装置，因此可以检测Na（Z=11）到U（Z=92）的元素。使用光束尺寸为0.5至2.0 mm的质子束，在100 nA的束流下，可以同时半自动地测量15个样品。使用四极三重磁体（型号OM 2000，Oxford Micro beams，Ltd.）附加到第二束端口产生小于1μm×1μm的方形质子微束。在50 pA电流和2.0mm2扫描面积下进行了微束扫描PIXE分析。空气中PIXE分析使用第三光束端口进行。这台机器的操作计划从2000年4月开始，由技术和安全司控制。文中还简要介绍了初步得到的一些结果。
In March 1999, electrostatic accelerator, Tandetron (Model 4117MC, High Voltage Engineering Europe Co.) was installed in the Electrostatic Accelerator Building for PIXE (Particle Induced X-ray Emission) analysis. The accelerating voltage is 0.4 to 1.7MV, and the maximum beam current is 5μA at 3.4MeV. This system has three beam ports for different types of PIXE analysis: normal, micro-beam and in-air. The first beam port is used for normal PIXE. Since two types of X-ray detecting device, Si (Li) and CdZnTe detectors, are available here, elements from Na (Z=11) to U (Z=92) are detectable. Fifteen samples can semi automatically be measured at one time using a proton beam of optical beam size from 0.5 to 2.0 mm at 100 nA beam current. A quadrupole triplet magnet (Model OM2000, Oxford Micro beams, Ltd.) attached to the second beam port produces a proton micro-beam of square shape less than 1μm×1μm. Micro-beam scanning PIXE analysis is carried out with this beam at 50pA current and scanning area up to 2.0mm square. The in-air PIXE analysis is performed using the third beam port. The operation of this machine has been scheduled to start from April 2000 and is controlled by Division of Technology and Safety. Some results preliminarily obtained are also shorn.