Writing Highly Ordered Macroscopic Patterns in Cylindrical Block Polymer Thin Films via Raster Solvent Vapor Annealing and Soft Shear.
Writing Highly Ordered Macroscopic Patterns in Cylindrical Block Polymer Thin Films via Raster Solvent Vapor Annealing and Soft Shear.
复制标题
通过光栅溶剂蒸气退火和软剪切在圆柱形嵌段聚合物薄膜中写入高度有序的宏观图案。
DOI：
10.1021/acsmacrolett.5b00126
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发表时间：
2015
影响因子：
7.015
通讯作者：
Thomas H. Epps
中科院分区：
文献类型：
--
作者：
M. Luo;D. Scott;Thomas H. Epps
嵌段聚合物(BPS)可能被用来作为先进纳米技术的大阵列纳米材料的模板。然而，定向BP自组装的实际应用通常需要相对较小尺寸的引导图案。在这项工作中，嵌段聚合物圆柱体在无模板衬底上的宏观对准是通过栅格溶剂蒸气退火结合软剪切(RSVA-SS)实现的。通过使用溶剂蒸汽输送喷嘴、聚二甲基硅氧烷剪切垫和电动工作台，实现了对纳米结构的空间控制。演示了包括虚线、交叉线和曲线在内的复杂图案，以及针对行业应用的大面积对齐和放大能力。用微观排列的BP纳米结构直接写入宏观图案的独特能力将为纳米技术的应用研究开辟新的途径。
Block polymers (BPs) potentially can be used to template large arrays of nanopatterns for advanced nanotechnologies. However, the practical utilization of directed BP self-assembly typically requires guide patterns of relatively small size scales. In this work, the macroscopic alignment of block polymer cylinders on a template-free substrate is achieved through raster solvent vapor annealing combined with soft shear (RSVA-SS). Spatial control over nanoscale structures is realized by using a solvent vapor delivery nozzle, poly(dimethylsiloxane) shearing pad, and motorized stage. Complex patterns including dashes, crossed lines, and curves are demonstrated, along with the ability for large area alignment and scale-up for industry applications. The unique ability to directly write macroscopic patterns with microscopically aligned BP nanostructures will open new avenues of applied research in nanotechnology.