Respiratory acclimation in Arabidopsis thaliana leaves at low temperature.
Respiratory acclimation in Arabidopsis thaliana leaves at low temperature.
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低温下拟南芥叶片的呼吸适应。
DOI：
10.1078/0176-1617-01054
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发表时间：
2004
影响因子：
4.3
通讯作者：
O. Keerberg
中科院分区：
文献类型：
--
作者：
P. Talts;T. Pärnik;P. Gardeström;O. Keerberg
25℃培养的拟南芥在5℃驯化后，叶片在5℃下的黑暗呼吸(RD)显著增加，在5℃下发育的叶片的RD尤其高，光下(RL)的叶片呼吸作用(RL)也增加，但比RD增加得少。驯化程度越高或低温发育的叶片，Rd/Pt值越高，Rl/Pt值基本不变。在冷驯化的叶片中，RL与3-磷酸甘油酸和丙酮酸无关，也与细胞质中的己糖磷酸库无关。在冷驯化过程中，刺参叶片的RL可能不受基质的限制。在本试验条件下，RD比RL对低温胁迫更为敏感。
Acclimation of 25 degrees C-grown Arabidopsis thaliana at 5 degrees C resulted in a marked increase of leaf respiration in darkness (Rd) measured at 5 degrees C. Rd was particularly high in leaves developed at 5 degrees C. Leaf respiration (non-photorespiratory intracellular decarboxylation) in the light (Rl) also increased during cold acclimation, but less so than did Rd. The ratio Rd/Pt (Pt - true photosynthesis) was higher in more acclimated or cold-developed leaves, while the ratio Rl/Pt remained unchanged. In cold-acclimated leaves, Rl did not correlate with 3-phosphoglycerate and pyruvate nor with hexose phosphate pools in the cytosol. Rl in A. thaliana leaves was probably not limited by the substrate during cold acclimation. Under the conditions tested, Rd was more sensitive to low temperature stress than Rl.