Ion beam micromachining of integrated optics components.
Ion beam micromachining of integrated optics components.
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DOI：
10.1364/ao.12.000455
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发表时间：
1973-03-01
期刊：
影响因子：
1.9
通讯作者：
Yariv, A
中科院分区：
文献类型：
--
作者：
Garvin, H L;Garmire, E;Yariv, A
薄膜集成光学元件（例如光导、调制器、定向耦合器和偏振器）需要高质量的边缘平滑度和小至亚微米尺寸的高分辨率图案形成。将全息和扫描电子束光刻与离子束微加工相结合的制造技术已生产出间距小至 2800 A 的平面相位光栅、GaAs 中的引导通道耦合器以及用于 10.6 微米辐射的线栅偏振器。
Thin film integrated optics components such as light guides, modulators, directional couplers, and polarizers demand high quality edge smoothness and high resolution pattern formation in dimensions down to submicrometer size. Fabrication techniques combining holographic and scanning electron beam lithography with ion beam micromachining have produced planar phase gratings with intervals as small as 2800 A, guiding channel couplers in GaAs, and also wire- grid polarizers for 10.6-,microm radiation.