T.Matsuura et al: "Atomic-Order Layer Etching of Silicon Nitride with a Role-Share Method Using an ECR Plasma" Abstract of 4th Asia-Pacific Conferece on Plasma Science and Technology & 11th Symposium on Plasma Science for Materials. 61 (1998)
T.Matsuura et al: "Atomic-Order Layer Etching of Silicon Nitride with a Role-Share Method Using an ECR Plasma" Abstract of 4th Asia-Pacific Conferece on Plasma Science and Technology & 11th Symposium on Plasma Science for Materials. 61 (1998)
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T.Matsuura 等人：“Atomic-Order Layer Etching of Silicon Nitride with a Role-Share Method using an ECR Plasma”第四届亚太等离子体科学技术会议摘要
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