Colloid monolayers as versatile lithographic masks
Colloid monolayers as versatile lithographic masks
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DOI：
10.1021/la9621123
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发表时间：
1997-05-28
期刊：
影响因子：
3.9
通讯作者：
Leiderer, P
中科院分区：
文献类型：
--
作者：
Burmeister, F;Schafle, C;Leiderer, P
胶体的受阻封闭堆积单层已经发现越来越多的应用，例如作为光刻掩模。单分子层通常是在自组织过程的帮助下产生的，其中将胶体的悬浮液施加到所需的基底上并干燥。这种方法要求基材具有良好的润湿性和光滑度，这严重限制了可能的基材数量。我们提出了一种新的方法，胶体单层的应用程序，几乎任何表面，这些困难是规避。首先在玻璃衬底上制造单层膜，然后在水面上漂浮。从那里，它们被转移到所需的基底上。其中转移的单层被用作光刻掩模的示例被示出在玻璃、氧化铟锡和二硒化钨上。转移的胶体单层的铜网格的透射电子显微镜证明了该技术的适用性曲面以及。
Hexagonally closed packed monolayers of colloids have found more and more applications, e.g. as lithographic masks. The monolayers are usually produced with the help of a self-organizing process where a suspension of colloids is applied to the desired substrate and left to dry. This method requires a good wettability and smoothness of the substrate, which severely limits the number of possible substrates. We present a new method for the application of colloid monolayers to almost any surface where these difficulties are circumvented. At first the monolayers are fabricated on glass substrates and afterwards floated off on a water surface. From there, they are transferred to the desired substrate. Examples where transferred monolayers were used as lithographic masks are shown on glass, indium tin oxide, and tungsten diselenide. The transfer of a colloid monolayer to a copper grid for transmission electron microscopy demonstrates the applicability of the technique to curved surfaces as well.