ECH Power Deposition Study in the Collisionless Plasma of LHD
ECH Power Deposition Study in the Collisionless Plasma of LHD
复制标题
LHD无碰撞等离子体中的ECH功率沉积研究
DOI：
10.1063/1.1593897
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发表时间：
2003
期刊：
影响因子：
--
通讯作者：
S. Morita
中科院分区：
文献类型：
--
作者：
S. Kubo;H. Idei;T. Shimozuma;Y. Yoshimura;T. Notake;K. Ohkubo;S. Inagaki;Y. Nagayama;K. Narihara;I. Yamada;S. Muto;S. Morita
功率沉积剖面是理解高温低碰撞等离子体输运机制的关键之一。利用功率调制技术，在大螺旋装置（LHD）中清晰地观察到了功率沉积曲线及其形状和位置随焦点位置的变化。这些功率沉积剖面与射线追迹计算结果相当吻合，但也与超热电子引起的差异相符。实验推导出的功率沉积曲线作为一维时变电子输运代码的初始输入，用于进一步研究等离子体约束。
Power deposition profile is one of the essential keys in understanding the transport mechanism in high temperature low collisional plasma. Using the power modulation techniques, the power deposition profile and its change in shape and position by the focal position is clearly observed experimentally in Large Helical Device (LHD). These power deposition profiles show fairly in good agreement with the results from ray tracing calculation, as well as discrepancies arising from supra thermal electrons. Such experimentally deduced power deposition profiles are used as the initial inputs of one dimensional time dependent electron transport code for the further investigation of the plasma confinement.