Experimental method for the extraction of intensity profiles by imaging the scattered pattern with a charge-coupled device

Experimental method for the extraction of intensity profiles by imaging the scattered pattern with a charge-coupled device
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通过用电荷耦合器件对散射图案进行成像来提取强度剖面的实验方法

DOI:
10.3788/col201210.052901
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发表时间:
2012-05
影响因子:
3.5
通讯作者:
Cheng, Chuanfu
Cheng, Chuanfu
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
Li, Haixia;Zhang, Meina;Chen, Xiaoyi;Liu, Chunxiang;Cheng, Chuanfu

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相似文献

报道了一种测量粗糙表面散射的实用实验方法。散射的图案被捕获在由两片毛玻璃组成的屏幕上,然后使用电荷耦合器件成像。通过将真实的空间中的模式转换到波矢量空间来提取散射强度轮廓。分别对硅片粗糙背面的各向同性和各向异性样品进行了研究,并测量了它们的光强分布。通过阅读特定取向曲线上的像素来获得各向异性样品的轮廓。利用角分辨光散射方案和理论提取样品的参数。结果与用原子力显微镜得到的测量结果吻合得很好。
A practicable experimental method for measuring scattering on rough surfaces is reported. The scattered patterns are captured on a screen composed of two pieces of ground glass and then imaged using a charge-coupled device. The scattered intensity profiles are extracted by converting the patterns in real space into the wave vector space. Isotropic and anisotropic samples of the rough backsides of silicon wafer are investigated respectively, and their intensity profiles are measured. The profiles of the anisotropic sample are obtained by reading the pixels on the specific orientation curves. The parameters of the samples are extracted using angle-resolved light-scattering schemes and theories. The results well agree with measurements obtained using an atomic force microscope.
DOI: 10.1016/s1079-4042(01)80055-2
发表时间: 2001
期刊: --
影响因子: --
作者:
Yiping Zhao;Gwo-Ching Wang;T. Lu
通讯作者: Yiping Zhao;Gwo-Ching Wang;T. Lu