Ultra-High Heat Flux Cooling Characteristics of Cryogenic Micro-Solid Nitrogen Particles and Its Application to Semiconductor Wafer Cleaning Technology
Ultra-High Heat Flux Cooling Characteristics of Cryogenic Micro-Solid Nitrogen Particles and Its Application to Semiconductor Wafer Cleaning Technology
复制标题
低温微固体氮颗粒超高热流冷却特性及其在半导体晶圆清洗技术中的应用
DOI:
10.1063/1.4860828
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发表时间:
2014
期刊:
影响因子:
--
通讯作者:
Tomoki Koike and Naoya Ochiai
中科院分区:
文献类型:
--
作者:
Jun Ishimoto;U Oh;Zhao Guanghan;Tomoki Koike and Naoya Ochiai