Sub-5 nm hard x-ray point focusing by a combined Kirkpatrick-Baez mirror and multilayer zone plate
Sub-5 nm hard x-ray point focusing by a combined Kirkpatrick-Baez mirror and multilayer zone plate
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DOI：
10.1364/oe.21.019311
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发表时间：
2013-08-12
期刊：
影响因子：
3.8
通讯作者：
Krebs, H. U.
中科院分区：
文献类型：
--
作者：
Doering, F.;Robisch, A. L.;Krebs, H. U.
诸如透镜系统之类的复合光学元件可以克服制造约束将对任何单个光学元件施加的关于分辨率、效率或像差的限制。在这项工作中，我们展示了前所未有的硬X射线的亚5 nm点聚焦，基于高增益Kirkpatrick-Baez(KB)反射镜系统和用于超短焦距f的高分辨率W/Si多层波带板(MZP)的组合。预聚焦允许将MZP半径限制在2微米以下，与所需的5 nm结构宽度和基本上无限的纵横比兼容，这是通过基于脉冲激光沉积(PLD)和聚焦离子束(FIB)的制造技术提供的。(C)2013年美国光学学会
Compound optics such as lens systems can overcome the limitations concerning resolution, efficiency, or aberrations which fabrication constraints would impose on any single optical element. In this work we demonstrate unprecedented sub-5 nm point focusing of hard x-rays, based on the combination of a high gain Kirkpatrick-Baez (KB) mirror system and a high resolution W/Si multilayer zone plate (MZP) for ultra-short focal length f. The pre-focusing allows limiting the MZP radius to below 2 mu m, compatible with the required 5 nm structure width and essentially unlimited aspect ratios, provided by enabling fabrication technology based on pulsed laser deposition (PLD) and focused ion beam (FIB). (c) 2013 Optical Society of America