Near-surface relaxation structure of annealed block copolymer film on Si substrates examined by grazing-incidence small-angle scattering utilizing soft X-rays
Near-surface relaxation structure of annealed block copolymer film on Si substrates examined by grazing-incidence small-angle scattering utilizing soft X-rays
复制标题
利用软 X 射线通过掠入射小角散射检查硅基底上退火嵌段共聚物薄膜的近表面弛豫结构
DOI：
10.1107/s0021889811003578
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发表时间：
2011
影响因子：
6.1
通讯作者：
Y. Kitajima
中科院分区：
文献类型：
--
作者：
H. Okuda;Kohki Takeshita;Shojiro Ochiai;S. Sakurai;Y. Kitajima
二维掠入射小角X射线散射（GISAXS）测量的SEBS 8嵌段共聚物薄膜沉积在Si（001）衬底上已被执行，以证明深度敏感的GISAXS利用软X射线的1.77 keV。 布拉格点在qz方向上的显着伸长，对应于微相分离，观察到的入射角接近临界角。伸长率解释的穿透深度，这限制了在垂直于样品表面的方向上的有效尺寸。证实了表面附近的晶格畸变。
Two-dimensional grazing-incidence small-angle X-ray scattering (GISAXS) measurements of SEBS8 block copolymer films deposited on Si(001) substrates have been performed to demonstrate depth-sensitive GISAXS utilizing soft X-rays of 1.77 keV. Remarkable elongation of the Bragg spots in the qz direction, corresponding to microphase separation, was observed for an angle of incidence close to the critical angle. The elongation was explained in terms of the penetration depth, which limits the effective size in the direction perpendicular to the sample surface. Lattice distortion near the surface was confirmed.