Fabrication of GaN nanostructure by hydrogen environment anisotropic thermal etching (HEATE) technique
Fabrication of GaN nanostructure by hydrogen environment anisotropic thermal etching (HEATE) technique
复制标题
氢环境各向异性热刻蚀(HEATE)技术制备GaN纳米结构
DOI:
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发表时间:
2014
期刊:
影响因子:
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通讯作者:
and A. Kikuchi
中科院分区:
文献类型:
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作者:
R. Kita;H. Hachiya;R. Hachiya;and A. Kikuchi