Magnetic characteristics of epitaxial NiO films studied by Raman spectroscopy
Magnetic characteristics of epitaxial NiO films studied by Raman spectroscopy
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拉曼光谱研究外延NiO薄膜的磁特性
DOI：
10.1063/5.0006085
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发表时间：
2020
期刊：
影响因子：
--
通讯作者：
Manfred Ramsteiner
中科院分区：
文献类型：
--
作者：
J. Feldl;Melanie Budde;Carsten Tschammer;Oliver Bierwagen;Manfred Ramsteiner
利用拉曼光谱研究了等离子体辅助分子束外延在MgO（100）衬底上生长的异质外延NiO薄膜的磁特性。对于尼尔温度的测定，我们证明了一个可靠的方法，通过分析的拉曼峰的温度依赖性源自二阶散射的磁振子。反铁磁耦合强度被发现是强烈的生长条件的影响。低温磁振子频率和Neel温度依赖于双轴晶格应变和由点缺陷控制的结构无序度。
Raman spectroscopy is utilized to study the magnetic characteristics of heteroepitaxial NiO thin films grown by plasma-assisted molecular beam epitaxy on MgO(100) substrates. For the determination of the Neel temperature, we demonstrate a reliable approach by analyzing the temperature dependence of the Raman peak originating from second-order scattering by magnons. The antiferromagnetic coupling strength is found to be strongly influenced by the growth conditions. The low-temperature magnon frequency and the Neel temperature are demonstrated to depend on the biaxial lattice strain and the degree of structural disorder which is dominated by point defects.