Nanomachining of silicon surface using atomic force microscope with diamond tip
Nanomachining of silicon surface using atomic force microscope with diamond tip
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DOI：
10.1115/1.2163364
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发表时间：
2006-08-01
影响因子：
4
通讯作者：
Ashida, Kiwamu
中科院分区：
文献类型：
--
作者：
Kawasegi, Noritaka;Takano, Noboru;Ashida, Kiwamu
本文研究了单晶硅纳米加工使用原子力显微镜与金刚石尖端悬臂为了使硅纳米加工，纳米加工悬臂与金字塔形金刚石尖端的开发，使用光刻和热灯丝化学气相沉积相结合。在不同的加工参数下，使用悬臂梁对硅进行纳米加工实验。硅表面可以以延性模式以几十到几百纳米的速率被去除，悬臂显示出上级耐磨性。实验表明，成功的单晶硅纳米加工。
This paper investigates nanomachining of single-crystal silicon using an atomic force microscope with a diamond-tip cantilever To enable nanomachining of silicon, a nanomachining cantilever with a pyramidal diamond tip was developed using a combination of photolithography and hot-filament chemical vapor deposition. Nanomachining experiments on silicon using the cantilever are demonstrated under various machining parameters. The silicon surface can be removed with a rate of several tens to hundreds of nanometers in ductile mode, and the cantilever shows superior wear resistance. The experiments demonstrate successful nanomachining of single-crystal silicon.